RANDOM FOREST REGRESSION FOR THE ESTIMATION OF LEAF AREA INDEX OF OKRA CROP USING GROUND BASED BISTATIC SCATTEROMETER
- Department of Physics, Indian Institute of Technology (BHU), Varanasi, India
Keywords: Bistatic scatterometer system, Okra crop, LAI, RF
Abstract. The specular bistatic scattering mechanism of Okra's crop was analyzed using dual polarized ground based bistatic scatterometer system at X, C, and L bands in the specular direction with the azimuthal angle(θ = 0°). An outdoor Okra crop bed of area 10 × 10 m2 was specially prepared for the estimation of leaf area index (LAI) at HH and VV polarizations over the angular range of incidence angle 20° to 60° at steps of 10°. The regression analysis was done between bistatic specular scattering coefficients and crop biophysical parameter at X, C, and L bands for HH and VV polarization at different angle of incidence to determine the optimum parameters of bistatic scatterometer system. The linear regression analysis showed the high correlation at 40° angle of incidence for all bands and polarizations for the Okra crop. The computed scattering coefficients and measured LAI of Okra crop for the seven growth stages at 40° angle of incidence were interpolated into 61 data sets. The data sets were divided into input, validation and testing for the training and testing of the developed random forest regression (RF) model for the estimation of LAI for Okra crop. The estimated values of LAI of Okra crop, by the developed RF regression model, were found more closer to the observed values at X band for VV polarization with coefficient of determination (R2 = 0.928) and low root mean square error (RMSE = 0.260 m2/m2) in comparison to C and L bands.